 
                                        X'Pert³ MRD
新一代高分辨X射线衍射仪
- 测量
- 
Epitaxy analysis
 Interface roughness
 Phase identification
 Phase quantification
 Reciprocal space analysis
 Residual stress
 Texture analysis
 Thin film metrology
 
- Wafer mapping
- 100 mm
- C-to-C wafer loader
- No
- Goniometer configuration
- Horizontal goniometer, Θ-2Θ
- Minimum step size
- 0.0001º
- 技术类型
- 
X-ray Diffraction (XRD)
 
